TY  - BOOK
AU  - Jones,Anthony C
AU  - Hitchman,Michael L
TI  - Chemical vapour deposition: precursors, processes and applications 
SN  - 9780854044658 (hbk.)
AV  - TS 695 C535.2009
PY  - 2009///
CY  - Cambridge, UK
PB  - Royal Society of Chemistry
KW  - Chemical vapor deposition
KW  - Deposición quimica por vapor
N1  - Incluye referencias bibliográficas e índice; Overview of chemical vapour deposition / Anthony C. Jones and Michael L. Hitchman -- CVD reactors and delivery system technology / Susan P. Krumdieck -- Modeling CVD processes / Mark D. Allendorf ... [et al.] -- Atomic layer deposition . Mikko Ritala and Jaakko Niinisto -- Basic chemistry of CVD and ALD precursors / Mohammad Azad Malik and Paul O'Brien -- CVD of III-V compound semiconductors / Jae-Hyun Ryou, Ravi Kanjolia and Russell D. Dupuis -- Chemical vapor deposition of metals: W, Al, Cu and Ru / Bing Luo and Wayne L. Gladfelter -- Chemical vapour deposition of metal oxides for microelectronics applications / Anthony C. Jones, Helen C. Aspinall and Paul R. Chalker -- Metal-organic chemical vapour deposition of refractory transition metal nitrides / Roland A. Fischer and Harish Parala -- CVD of functional coatings on glass / Ivan P. Parkin and Robert G. Palgrave -- Photo-assisted CVD / Stuart J.C. Irvine and Dan Lamb -- Plasma enhanced chemical vapour deposition processes / Segei E. Alexander and Michael L. Hitchman -- Commercial aspects of CVD / Albert Barry Leese and Alan Rodney Mills
ER  -