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Chemical vapour deposition : precursors, processes and applications / edited by Anthony C. Jones, Michael L. Hitchman.

Colaborador(es): Tipo de material: TextoTextoDetalles de publicación: Cambridge, UK : Royal Society of Chemistry, 2009.Descripción: xv, 582 p. : il. (algunas col.), planos ; 26 cmISBN:
  • 9780854044658 (hbk.)
  • 0854044655 (hbk.)
Otro título:
  • Chemical vapor deposition
Tema(s): Clasificación LoC:
  • TS 695 C535.2009
Contenidos:
Overview of chemical vapour deposition / Anthony C. Jones and Michael L. Hitchman -- CVD reactors and delivery system technology / Susan P. Krumdieck -- Modeling CVD processes / Mark D. Allendorf ... [et al.] -- Atomic layer deposition . Mikko Ritala and Jaakko Niinisto -- Basic chemistry of CVD and ALD precursors / Mohammad Azad Malik and Paul O'Brien -- CVD of III-V compound semiconductors / Jae-Hyun Ryou, Ravi Kanjolia and Russell D. Dupuis -- Chemical vapor deposition of metals: W, Al, Cu and Ru / Bing Luo and Wayne L. Gladfelter -- Chemical vapour deposition of metal oxides for microelectronics applications / Anthony C. Jones, Helen C. Aspinall and Paul R. Chalker -- Metal-organic chemical vapour deposition of refractory transition metal nitrides / Roland A. Fischer and Harish Parala -- CVD of functional coatings on glass / Ivan P. Parkin and Robert G. Palgrave -- Photo-assisted CVD / Stuart J.C. Irvine and Dan Lamb -- Plasma enhanced chemical vapour deposition processes / Segei E. Alexander and Michael L. Hitchman -- Commercial aspects of CVD / Albert Barry Leese and Alan Rodney Mills.
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Libros Biblioteca Francisco Xavier Clavigero Acervo Acervo General TS 695 C535.2009 (Navegar estantería(Abre debajo)) ej. 1 Disponible UIA033905

Incluye referencias bibliográficas e índice.

Overview of chemical vapour deposition / Anthony C. Jones and Michael L. Hitchman -- CVD reactors and delivery system technology / Susan P. Krumdieck -- Modeling CVD processes / Mark D. Allendorf ... [et al.] -- Atomic layer deposition . Mikko Ritala and Jaakko Niinisto -- Basic chemistry of CVD and ALD precursors / Mohammad Azad Malik and Paul O'Brien -- CVD of III-V compound semiconductors / Jae-Hyun Ryou, Ravi Kanjolia and Russell D. Dupuis -- Chemical vapor deposition of metals: W, Al, Cu and Ru / Bing Luo and Wayne L. Gladfelter -- Chemical vapour deposition of metal oxides for microelectronics applications / Anthony C. Jones, Helen C. Aspinall and Paul R. Chalker -- Metal-organic chemical vapour deposition of refractory transition metal nitrides / Roland A. Fischer and Harish Parala -- CVD of functional coatings on glass / Ivan P. Parkin and Robert G. Palgrave -- Photo-assisted CVD / Stuart J.C. Irvine and Dan Lamb -- Plasma enhanced chemical vapour deposition processes / Segei E. Alexander and Michael L. Hitchman -- Commercial aspects of CVD / Albert Barry Leese and Alan Rodney Mills.