000			02140nam a2200337 a 4500
001			000545236
003			OCoLC
005			20240105150225.0
008			100628s2009 xxkae rb 001 0 eng d
010			_a 2009419379
020			_a9780854044658 (hbk.)
020			_a0854044655 (hbk.)
035			_a355937
040			_aUKM _bspa _cUKM _dUIASF
050		4	_aTS 695 _bC535.2009
245	0	0	_aChemical vapour deposition : _bprecursors, processes and applications / _cedited by Anthony C. Jones, Michael L. Hitchman.
246	3		_aChemical vapor deposition
260			_aCambridge, UK : _bRoyal Society of Chemistry, _c2009.
300			_axv, 582 p. : _bil. (algunas col.), planos ; _c26 cm.
504			_aIncluye referencias bibliográficas e índice.
505	0		_aOverview of chemical vapour deposition / Anthony C. Jones and Michael L. Hitchman -- CVD reactors and delivery system technology / Susan P. Krumdieck -- Modeling CVD processes / Mark D. Allendorf ... [et al.] -- Atomic layer deposition . Mikko Ritala and Jaakko Niinisto -- Basic chemistry of CVD and ALD precursors / Mohammad Azad Malik and Paul O'Brien -- CVD of III-V compound semiconductors / Jae-Hyun Ryou, Ravi Kanjolia and Russell D. Dupuis -- Chemical vapor deposition of metals: W, Al, Cu and Ru / Bing Luo and Wayne L. Gladfelter -- Chemical vapour deposition of metal oxides for microelectronics applications / Anthony C. Jones, Helen C. Aspinall and Paul R. Chalker -- Metal-organic chemical vapour deposition of refractory transition metal nitrides / Roland A. Fischer and Harish Parala -- CVD of functional coatings on glass / Ivan P. Parkin and Robert G. Palgrave -- Photo-assisted CVD / Stuart J.C. Irvine and Dan Lamb -- Plasma enhanced chemical vapour deposition processes / Segei E. Alexander and Michael L. Hitchman -- Commercial aspects of CVD / Albert Barry Leese and Alan Rodney Mills.
650		0	_aChemical vapor deposition
650		4	_aDeposición quimica por vapor
700	1		_aJones, Anthony C
700	1		_aHitchman, Michael L
905			_a01
942		1	_cNEWBFXC1
999			_c513949 _d513949
980			_851 _gRonald RUIZ